Issue 44, 2011

New air-stable solution-processed organic n-type semiconductors based on sulfur-rich core-expanded naphthalene diimides

Abstract

Among the reported organic n-type semiconductors naphthalene diimide (NDI) derivatives have received more and more attention. In this paper, we report two sulfur-rich expanded NDI derivatives 1 and 2 containing 1,3-dithiole-2-thione-4,5-dithiolate and 1,3-dithiole-2-one-4,5-dithiolate units, respectively. Electrochemical, absorption, spectral and theoretical calculation studies show that LUMO energies of 1 and 2 are lower than that of a typical NDI without functional substitution. OFET devices based on thin-films of 1 and 2 which can be easily solution-processed are fabricated with conventional techniques. The performance of OFET devices of 1 and 2 can be significantly improved by fast annealing (about 30 s) their thin-films in air, with high on/off ratios (106–107) and relatively high electron mobilities of up to 0.05 and 0.04 cm2 V−1s−1, respectively.

Graphical abstract: New air-stable solution-processed organic n-type semiconductors based on sulfur-rich core-expanded naphthalene diimides

Supplementary files

Article information

Article type
Paper
Submitted
30 Jul 2011
Accepted
05 Sep 2011
First published
13 Oct 2011

J. Mater. Chem., 2011,21, 18042-18048

New air-stable solution-processed organic n-type semiconductors based on sulfur-rich core-expanded naphthalene diimides

L. Tan, Y. Guo, G. Zhang, Y. Yang, D. Zhang, G. Yu, W. Xu and Y. Liu, J. Mater. Chem., 2011, 21, 18042 DOI: 10.1039/C1JM13637B

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