Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperatures
Abstract
* Corresponding authors
a
Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki, P.O. Box 55, Finland
E-mail:
jani.hamalainen@helsinki.fi
Fax: +358 9 191 50198
b Accelerator Laboratory, Department of Physics, University of Jyväskylä, P.O. Box 35, Finland
J. Hämäläinen, T. Hatanpää, E. Puukilainen, T. Sajavaara, M. Ritala and M. Leskelä, J. Mater. Chem., 2011, 21, 16488 DOI: 10.1039/C1JM12245B
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