Issue 37, 2011
From the journal:

Journal of Materials Chemistry

Principles of voxel refinement in optical direct write lithography†

Timothy F. Scott,a   Christopher J. Kloxin,b   Darren L. Forman,c   Robert R. McLeodc  and  Christopher N. Bowman*a  

* Corresponding authors

a Department of Chemical and Biological Engineering, University of Colorado, Boulder, CO, USA
E-mail: christopher.bowman@colorado.edu

b Department of Materials Science and Engineering, and Department of Chemical Engineering, University of Delaware, Newark, Delaware, USA

c Department of Electrical, Computer, and Energy Engineering, University of Colorado, Boulder, Colorado, USA

Abstract

Optical direct write lithography (ODWL) has the capacity for generating three dimensional arbitrary patterns. Here we examine principles for voxel refinement and relate several techniques for achieving nanoscale resolution. The influence of optics, gelation, and polymerization scaling behavior are expounded, demonstrating the necessity for adopting a multidisciplinary mindset to control both voxel dimensions and minimize out-of-focus reactions. Aspects of two-photon ODWL are reviewed and recent multi-beam ODWL approaches that draw inspiration from STED microscopy are examined.

Graphical abstract: Principles of voxel refinement in optical direct write lithography

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Article information

DOI
https://doi.org/10.1039/C1JM11915J
Article type
Feature Article
Submitted
02 May 2011
Accepted
16 Jun 2011
First published
08 Jul 2011

J. Mater. Chem., 2011,21, 14150-14155

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Principles of voxel refinement in optical direct write lithography

T. F. Scott, C. J. Kloxin, D. L. Forman, R. R. McLeod and C. N. Bowman, J. Mater. Chem., 2011, 21, 14150 DOI: 10.1039/C1JM11915J

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