Fabrication of three-dimensional imprint lithography templates by colloidal dispersions

Abstract

Self-aligned imprint lithography (SAIL) enables the patterning and alignment of submicron-sized features on metre-scaled flexible substrates in the roll-to roll (R2R) environment. SAIL solves the problem of precision interlayer registry on a moving web by encoding all the geometry information required for the entire patterning steps into a monolithic three-dimensional mask that is imprinted on the thin film stack deposited on a flexible substrate. Soft molds made of plastics or elastomers cast on a silicon master have been used as stamps to pattern the 3D masks because of their low cost and ease of fabrication. However, the durability of these stamps is one factor that limits their efficiency in a R2R process. Fluorothermoplastics are low cost imprint stamp materials with great mechanical strength and chemical compatibility but with low gas permeability that trap air bubbles in the photopolymer during the imprint process. This paper describes the strategy for increasing gas permeability of fluorothermoplastics by introducing voids or pores in the stamp material by fabricating the stamps with aqueous colloidal dispersions of tetrafluoroethylene–hexafluoropropylene copolymer (FEP) nanoparticles. The basic idea is that the hard fluorinated particles, whose modulus is too high to deform during drying, remain as hard spheres and lead to a porous packing when drying is complete. The selection of suitable additives to eliminate cracks created by capillary stresses during water evaporation is also described in this paper.