Reworkable dimethacrylates with low shrinkage and their application to UV nanoimprint lithography
Abstract
Four types of reworkable dimethacrylates bearing hemiacetal ester groups were synthesized and the UV curing and degradation were studied. UV
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* Corresponding authors
a
Department of Applied Chemistry, Osaka Prefecture University, 1-1 Gakuen-cho, Nakaku, Sakai, Osaka, Japan
E-mail:
mshirai@chem.osakafu-u.ac.jp
Fax: +81-72-254-9291
Tel: +81-72-254-9291
Four types of reworkable dimethacrylates bearing hemiacetal ester groups were synthesized and the UV curing and degradation were studied. UV
D. Matsukawa, H. Okamura and M. Shirai, J. Mater. Chem., 2011, 21, 10407 DOI: 10.1039/C0JM04386A
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