Issue 6, 2011

Room temperature ZnO growth by rf magnetron sputtering on top of photoactive P3HT: PCBM for organic solar cells

Abstract

In this work, we use rf magnetron sputtering to deposit at room temperature a ZnO thin film on top of a photoactive material based on P3HT:PCBM blend for organic photovoltaic devices. We investigate the influence of the sputtering conditions on the ZnO crystallinity, on the substrate layer nanoscale morphology and on the photovoltaic device performances. We show that, under appropriate sputtering conditions, the modification of the P3HT:PCBM film causes no functional damage of the photoactive layer, and leads to an improved performance of the photovoltaic devices.

Graphical abstract: Room temperature ZnO growth by rf magnetron sputtering on top of photoactive P3HT: PCBM for organic solar cells

Article information

Article type
Paper
Submitted
22 Jul 2010
Accepted
12 Oct 2010
First published
29 Nov 2010

J. Mater. Chem., 2011,21, 1953-1958

Room temperature ZnO growth by rf magnetron sputtering on top of photoactive P3HT: PCBM for organic solar cells

Y. Jouane, S. Colis, G. Schmerber, P. Kern, A. Dinia, T. Heiser and Y.-A. Chapuis, J. Mater. Chem., 2011, 21, 1953 DOI: 10.1039/C0JM02354J

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