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Issue 45, 2011
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An investigation on focused electron/ion beam induced degradation mechanisms of conjugated polymers

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Abstract

Irradiation damage, caused by the use of beams in the electron microscopes, leads to undesired physical/chemical material property changes or uncontrollable modification of structures that are being processed. Particularly, soft matter such as polymers or biological materials is highly susceptible and very much prone to react on irradiation by electron and ion beams. The effect is even higher when materials are subjected to energetic species such as ions that possess high momentum and relatively low mean path due to their mass. Especially when Ga+ ions (used as the ion source in Focused Ion Beam (FIB) instruments) are considered, the end-effect might even be the total loss of the material’s properties. This paper will discuss the possible types of degradation mechanisms and defect formations that can take place during ion and electron beam irradiation of the conjugated polymers: e.g. polyfluorene (PF) and poly-3-hexylthiophene (P3HT) thin films. For the investigation of the irradiation induced degradation mechanisms in this study, complementary analytical techniques such as Raman Spectroscopy (RS), Infrared Spectroscopy (IR), Electron Energy Loss Spectroscopy (EELS), Atomic Force Microscopy (AFM), and Fluorescence Microscopy including Photoluminescence (PL) and Electroluminescence (EL) Microscopy were applied.

Graphical abstract: An investigation on focused electron/ion beam induced degradation mechanisms of conjugated polymers

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Publication details

The article was received on 26 Jul 2011, accepted on 14 Sep 2011 and first published on 12 Oct 2011


Article type: Paper
DOI: 10.1039/C1CP22406A
Citation: Phys. Chem. Chem. Phys., 2011,13, 20235-20240

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    An investigation on focused electron/ion beam induced degradation mechanisms of conjugated polymers

    M. Sezen, H. Plank, E. Fisslthaler, B. Chernev, A. Zankel, E. Tchernychova, A. Blümel, E. J. W. List, W. Grogger and P. Pölt, Phys. Chem. Chem. Phys., 2011, 13, 20235
    DOI: 10.1039/C1CP22406A

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