- Article type
- 23 Mar 2011
- 11 Jul 2011
- First published
- 03 Aug 2011
A general model of metal underpotential deposition in the presence of
thiol-based additives based on an in situSTM study
Y. Yanson, J. W. M. Frenken and M. J. Rost, Phys. Chem. Chem. Phys., 2011, 13, 16095 DOI: 10.1039/C1CP20886A
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