Issue 22, 2011

HO2 formation from the OH + benzene reaction in the presence of O2

Abstract

In this study we investigated the secondary formation of HO2 following the benzene + OH reaction in N2 with variable O2 content at atmospheric pressure and room temperature in the absence of NO. After pulsed formation of OH, HOx (= OH + HO2) and OH decay curves were measured by means of a laser-induced fluorescence technique (LIF). In synthetic air the total HO2 yield was determined to be 0.69 ± 0.10 by comparison to results obtained with CO as a reference compound. HO2 is expected to be a direct product of the reaction of the intermediately formed OHbenzene adduct with O2. The HO2 yield is slightly greater than the currently recommended yield of the proposed HO2 co-product phenol (∼53%). This hints towards other, minor HO2 forming channels in the absence of NO, e.g. the formation of epoxide species that was proposed in the literature. For other test compounds upper limits of HO2 yields of 0.10 (isoprene) and 0.05 (cyclohexane) were obtained, respectively. In further experiments at low O2 concentrations (0.06–0.14% in N2) rate constants of (2.4 ± 1.1) × 10−16 cm3 s−1 and (5.6 ± 1.1) × 10−12 cm3 s−1 were estimated for the OHbenzene adduct reactions with O2 and O3, respectively. The rate constant of the unimolecular dissociation of the adduct back to benzene + OH was determined to be (3.9 ± 1.3) s−1. The HO2 yield at low O2 was similar to that found in synthetic air, independent of O2 and O3 concentrations indicating comparable HO2 yields for the adduct + O2 and adduct + O3 reactions.

Graphical abstract: HO2 formation from the OH + benzene reaction in the presence of O2

Article information

Article type
Paper
Submitted
08 Feb 2011
Accepted
05 Apr 2011
First published
04 May 2011

Phys. Chem. Chem. Phys., 2011,13, 10699-10708

HO2 formation from the OH + benzene reaction in the presence of O2

S. Nehr, B. Bohn, H. Fuchs, A. Hofzumahaus and A. Wahner, Phys. Chem. Chem. Phys., 2011, 13, 10699 DOI: 10.1039/C1CP20334G

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