Solvent response of polymers for micromachine manipulation

Ye Tian; Yong-Lai Zhang; Hong Xia; Li Guo; Jin-Feng Ku; Yan He; Ran Zhang; Bin-Zong Xu; Qi-Dai Chen; Hong-Bo Sun

doi:10.1039/C0CP02006K

Solvent response of polymers for micromachine manipulation†

Ye Tian,^a Yong-Lai Zhang,*^a Hong Xia,^a Li Guo,^a Jin-Feng Ku,^a Yan He,^a Ran Zhang,^a Bin-Zong Xu,^a Qi-Dai Chen^a and Hong-Bo Sun*^ab

Author affiliations

* Corresponding authors

^a State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012, China
E-mail: yonglaizhang@jlu.edu.cn, hbsun@jlu.edu.cn
Fax: 86 431 85168281
Tel: 86 431 85168281

^b College of Physics, Jilin University, 2699 Qianjin Street, Changchun 130012, China

Abstract

A novel solvent responsive polymer micromachine has been successfully fabricated by two-photon photopolymerization (TPP) of methacrylate-based photoresists. The moving part of the micromachine could be easily driven by interfacial solvent polarity induced swelling and shrinking of the photopolymer networks. Furthermore, the driving performance of the micromachine could be precisely modulated by varying the laser scanning step length during fabrication.

This article is part of the themed collection: Materials innovation through interfacial physics and chemistry

Physical Chemistry Chemical Physics

Solvent response of polymers for micromachine manipulation†

Abstract

Supplementary files

Article information

Download Citation

Permissions

Solvent response of polymers for micromachine manipulation

Social activity

Search articles by author

Spotlight

Advertisements