Issue 12, 2011
From the journal:

CrystEngComm

Anatase-assisted growth of nanoscale crystalline brookite film and rutile rods on SiO2/Si substrate in a single hydrothermal process†

Xianhui Meng,a   Jong Hak Lee,b   Min-Ho Park,a   Seong Man Yu,b   Dong-Wook Shin,b   Cheolwoong Yang,a   Vasant Bhoraskarac  and  Ji-Beom Yoo*ab  

* Corresponding authors

a School of Advanced Materials Science & Engineering(BK21), Sungkyunkwan University, Suwon, Korea

b SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, Korea
E-mail: jbyoo@skku.edu
Fax: +82-312907410
Tel: +82 312907413

c Department of Physics, University of Pune, Pune, India

Abstract

In a single hydrothermal reaction in Ti–HCl solution at 120 °C/140 °C, 50 to 180 nm thick brookite layers and, 1 to 4.5 µm long rutile rods were grown on anatase film with SiO2/Si substrate, and confirmed by SEM, TEM, XRD and Raman measurements. The growth mechanism is correlated with Cl/Ti ratio and evaporation of HCl from solution.

Graphical abstract: Anatase-assisted growth of nanoscale crystalline brookite film and rutile rods on SiO2/Si substrate in a single hydrothermal process

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Article information

DOI
https://doi.org/10.1039/C0CE00643B
Article type
Communication
Submitted
14 Sep 2010
Accepted
05 Jan 2011
First published
19 Jan 2011

CrystEngComm, 2011,13, 3983-3987

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Anatase-assisted growth of nanoscale crystalline brookite film and rutile rods on SiO2/Si substrate in a single hydrothermal process

X. Meng, J. H. Lee, M. Park, S. M. Yu, D. Shin, C. Yang, V. Bhoraskar and J. Yoo, CrystEngComm, 2011, 13, 3983 DOI: 10.1039/C0CE00643B

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