Issue 36, 2011
From the journal:

Chemical Communications

Deposition of platinum patterns by a liquid process†

Zhongrong Shen,*a   Jinwang Li,*a   Yasuo Matsukiab  and  Tatsuya Shimoda*ac  

* Corresponding authors

a Japan Science and Technology Agency, ERATO, Shimoda Nano Liquid Process Project, 2-5-3 Asahidai, Nomi 923-1211, Japan
E-mail: z-shen@ishikawa-sp.com, lijw@ishikawa-sp.com
Fax: +81-761-51-7791
Tel: +81-761-51-7781

b Tsukuba Research Laboratories, JSR Corporation, 25 Miyukigaoka, Tsukuba, Ibaraki, Japan

c School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi 923-1292, Japan
E-mail: tshimoda@jaist.ac.jp
Fax: +81-761-51-1149
Tel: +81-761-51-1550

Abstract

In contrast to the traditional chemical vapor deposition technique under high vacuum, we introduce a deposition method in liquid to prepare Pt patterns on substrate near 100 °C by seed growth.

Graphical abstract: Deposition of platinum patterns by a liquid process

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Article information

DOI
https://doi.org/10.1039/C1CC12138C
Article type
Communication
Submitted
14 Apr 2011
Accepted
11 May 2011
First published
31 May 2011

Chem. Commun., 2011,47, 9992-9994

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Deposition of platinum patterns by a liquid process

Z. Shen, J. Li, Y. Matsuki and T. Shimoda, Chem. Commun., 2011, 47, 9992 DOI: 10.1039/C1CC12138C

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