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Issue 10, 2010
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Metal nanowire grating patterns

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Abstract

Metal nanowire patterning in the form of grating structures has been carried out using a wide range of lithography techniques, and many hybrid methods derived from them. The challenge is to achieve sub-100 nm linewidths with controllable spacing and thickness over large areas of substrates with high throughput. In particular, the patterns with linewidth and spacing of a few tens of nm offer properties of great interest in optoelectronics and plasmonics. Crossbar grating structures—two gratings patterned perpendicular to each other—will play an important role as ultra-high density electrode grids in memristive devices for non-volatile memory.

Graphical abstract: Metal nanowire grating patterns

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Article information


Submitted
05 Feb 2010
Accepted
01 Apr 2010
First published
08 Jun 2010

Nanoscale, 2010,2, 2035-2044
Article type
Minireview

Metal nanowire grating patterns

G. U. Kulkarni and B. Radha, Nanoscale, 2010, 2, 2035
DOI: 10.1039/C0NR00088D

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