Issue 12, 2010
From the journal:

Nanoscale

DNA-mediated site-specific deposition of gold nanoparticles on silicon wafers†

Katharina J. C. Heimanna  and  Clemens Richert*ab  

* Corresponding authors

a Institute of Organic Chemistry and Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany
E-mail: katharina@rrg.uka.de
Fax: +49 721 608 4825
Tel: +49 721 608 7212

b Institut für Organische Chemie, Universität Stuttgart, Stuttgart, Germany
E-mail: lehrstuhl-2@oc.uni-stuttgart.de
Fax: +49 711 685 64321
Tel: +49 711 685 64311

Abstract

We report a method for the site-specific deposition of gold nanoparticles, as programmed by DNA sequences immobilized on the surface of silicon oxide-coated silicon wafers. After optimization of surface chemistries, selectivities of between 8 : 1 and 118 : 1 were achieved for the DNA-based sorting of populations of gold nanoparticle of 15 nm and 60 nm diameter from a common suspension via oligonucleotide duplex formation.

Graphical abstract: DNA-mediated site-specific deposition of gold nanoparticles on silicon wafers

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Article information

DOI
https://doi.org/10.1039/C0NR00612B
Article type
Communication
Submitted
18 Aug 2010
Accepted
27 Sep 2010
First published
21 Oct 2010

Nanoscale, 2010,2, 2579-2582

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DNA-mediated site-specific deposition of gold nanoparticles on silicon wafers

K. J. C. Heimann and C. Richert, Nanoscale, 2010, 2, 2579 DOI: 10.1039/C0NR00612B

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