Jump to main content
Jump to site search

Issue 14, 2010
Previous Article Next Article

Patterning microfluidic device wettability using flow confinement

Author affiliations

Abstract

We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.

Graphical abstract: Patterning microfluidic device wettability using flow confinement

Back to tab navigation

Supplementary files

Article information


Submitted
10 Mar 2010
Accepted
05 May 2010
First published
21 May 2010

Lab Chip, 2010,10, 1774-1776
Article type
Communication

Patterning microfluidic device wettability using flow confinement

A. R. Abate, J. Thiele, M. Weinhart and D. A. Weitz, Lab Chip, 2010, 10, 1774
DOI: 10.1039/C004124F

Social activity

Search articles by author

Spotlight

Advertisements