Jump to main content
Jump to site search
Access to RSC content Close the message box

Continue to access RSC content when you are not at your institution. Follow our step-by-step guide.


Issue 21, 2010
Previous Article Next Article

Ordered nanoporous membranes based on diblock copolymers with high chemical stability and tunable separation properties

Author affiliations

Abstract

Block copolymers, having the ability to self-assemble into arrays of well-defined nanostructures, can be turned into thin films. Their application as membrane was so far strongly limited by the fact that these thin films have to be transferred manually onto a porous membrane support, or because of the very strict preparation conditions. A simple method is reported here to directly produce ordered nanoporous membranes on porous supports. Well-ordered membrane structures were prepared via a simple strategy exploiting blending of a block copolymer (PS-b-PEO) with a homopolymer (PAA), involving no thermal or solvent treatment. The membranes could be directly introduced on several types of porous membrane supports via straightforward spin or dip coating of very small amounts of polymer. Moreover, the permeability of the membranes could be readily tuned by removal of the PAA without changing membrane morphology. While already inherently stable in e.g. sodium hypochlorite solutions, the chemical stability of the membranes could be further enhanced via simple UV-radiation, clearly widening their potential application field.

Graphical abstract: Ordered nanoporous membranes based on diblock copolymers with high chemical stability and tunable separation properties

Back to tab navigation

Supplementary files

Article information


Submitted
21 Dec 2009
Accepted
09 Mar 2010
First published
29 Mar 2010

J. Mater. Chem., 2010,20, 4333-4339
Article type
Paper

Ordered nanoporous membranes based on diblock copolymers with high chemical stability and tunable separation properties

X. Li, C. Fustin, N. Lefèvre, J. Gohy, S. D. Feyter, J. D. Baerdemaeker, W. Egger and I. F. J. Vankelecom, J. Mater. Chem., 2010, 20, 4333
DOI: 10.1039/B926774C

Search articles by author

Spotlight

Advertisements