Issue 24, 2009
From the journal:

Journal of Materials Chemistry

A UV curable resin with reworkable properties: application to imprint lithography†

Daisaku Matsukawa,a   Hiroyuki Wakayama,a   Kazuyuki Mitsukura,a   Haruyuki Okamura,a   Yoshihiko Hiraib  and  Masamitsu Shirai*a  

* Corresponding authors

a Department of Applied Chemistry, Osaka Prefecture University, 1-1 Gakuen-cho, Nakaku, Sakai, Osaka 599-8531, Japan
E-mail: mshirai@chem.osakafu-u.ac.jp
Fax: +81-72-254-9291
Tel: +81-72-254-9291

b Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuen-cho, Nakaku, Sakai, Osaka 599-8531, Japan

Abstract

Difunctional methacrylate monomers having a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint lithography. UV curing of the monomers was performed with 365 nm light and photo-induced degradation of the cured resins was performed using 254 nm light.

Graphical abstract: A UV curable resin with reworkable properties: application to imprint lithography

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Article information

DOI
https://doi.org/10.1039/B905188K
Article type
Communication
Submitted
13 Mar 2009
Accepted
11 May 2009
First published
20 May 2009

J. Mater. Chem., 2009,19, 4085-4087

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A UV curable resin with reworkable properties: application to imprint lithography

D. Matsukawa, H. Wakayama, K. Mitsukura, H. Okamura, Y. Hirai and M. Shirai, J. Mater. Chem., 2009, 19, 4085 DOI: 10.1039/B905188K

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