Issue 27, 2009

Polyhedral oligomeric silsesquioxanes tethered with perfluoroalkylthioether corner groups: Facile synthesis and enhancement of hydrophobicity of their polymer blends

Abstract

Octa(vinyl)-POSS or octa(vinyldimethylsilyloxy)-POSS reacts with perfluoroalkyl thiol in the presence of 2,2′-azobisisobutyronitrile to afford perfluoroalkylthioether substituted POSS compounds in high yields. 29Si NMR and MALDI-TOF mass spectroscopic analyses indicate that the eight perfluoroalkylthioether chains are attached to the POSS core structure. Studies on poly(methyl methacrylate) (PMMA) blends with 5 wt% fluorinated POSS (fluoroPOSS) reveal that the POSS molecules considerably enhance the hydrophobicity of polymer blend surfaces as evidenced by significant increases in water contact angles from 71° for pure PMMA to 114–124° for fluoroPOSS-blends, making this type of fluoroPOSS a promising new class of highly hydrophobic hybrid materials.

Graphical abstract: Polyhedral oligomeric silsesquioxanes tethered with perfluoroalkylthioether corner groups: Facile synthesis and enhancement of hydrophobicity of their polymer blends

Article information

Article type
Paper
Submitted
08 Jan 2009
Accepted
23 Apr 2009
First published
27 May 2009

J. Mater. Chem., 2009,19, 4740-4745

Polyhedral oligomeric silsesquioxanes tethered with perfluoroalkylthioether corner groups: Facile synthesis and enhancement of hydrophobicity of their polymer blends

J. Xu, X. Li, C. M. Cho, C. L. Toh, L. Shen, K. Y. Mya, X. Lu and C. He, J. Mater. Chem., 2009, 19, 4740 DOI: 10.1039/B900299E

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements