Issue 20, 2009

Tailoring fluorene-based oligomers for fast photopatterning

Abstract

We present a simple and efficient strategy for the synthesis of acrylate-functionalized oligofluorenes. Within one single synthetic step photopatternable oligofluorenes with variable acrylate contents and molecular weights are formed. The Yamamoto condensation yields well defined oligomers by the direct polymerization of fluorene acrylates. The acrylate contents of the oligomers was varied from 10% to 100% by a statistical co-oligomerization. Photolithography experiments showed that for the species with highest acrylate content a crosslinking time of only 30 seconds leads to well resolved polyfluorene patterns. A minimum lateral resolution of 1 µm was achieved.

Graphical abstract: Tailoring fluorene-based oligomers for fast photopatterning

Article information

Article type
Paper
Submitted
19 Dec 2008
Accepted
25 Feb 2009
First published
27 Mar 2009

J. Mater. Chem., 2009,19, 3207-3212

Tailoring fluorene-based oligomers for fast photopatterning

E. Scheler and P. Strohriegl, J. Mater. Chem., 2009, 19, 3207 DOI: 10.1039/B822894A

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