Issue 4, 2009
From the journal:

Journal of Materials Chemistry

Non-ionic photo-acid generators for applications in two-photon lithography†

Lorenz Steidl,‡ad   Shalin J. Jhaveri,‡ab   Ramakrishnan Ayothi,a   Jing Sha,a   Jesse D. McMullen,c   Sin Yee Cindy Ng,a   Warren R. Zipfel,c   Rudolf Zentel*d  and  Christopher K. Ober*a  

* Corresponding authors

a Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA
E-mail: cober@ccmr.cornell.edu
Fax: +1 (607) 255-2365
Tel: (+607) 255-8417

b Department of Chemistry and Chemical Biology, Cornell University, Ithaca, NY, USA

c Department of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA

d Institute of Organic Chemistry, Department of Chemistry and Pharmacy, University of Mainz, Duesbergweg 10-14, Mainz, Germany
E-mail: zentel@uni-mainz.de
Fax: +49 (6131) 39-24778
Tel: +49 (6131) 39-20361

Abstract

Non-ionic photoacid generators (PAGs) have been designed and synthesized for use in two-photon lithography (TPL). The chromophores in these new PAGs are covalently linked to the photocleavable group by a flexible joint. Their thermal stability, solubility and efficiency to produce acid under both one- and two-photon excitation were characterized. The potential of these PAGs for TPL was tested in two negative-tone resist systems relying on different mechanisms: free-radical/cationic polymerization or a cationically initiated cross-linking reaction. These PAGs needed lower threshold power for polymerization compared to a commercially available photoinitiator, isopropylthioxanthone, and a photoacid generator, N-hydroxynaphthalimide triflate. Microstructures with a resolution of 0.6 µm were fabricated and the threshold power for polymerization was found to be below 2 mW.

Graphical abstract: Non-ionic photo-acid generators for applications in two-photon lithography

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Article information

DOI
https://doi.org/10.1039/B816434G
Article type
Paper
Submitted
19 Sep 2008
Accepted
30 Oct 2008
First published
08 Dec 2008

J. Mater. Chem., 2009,19, 505-513

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Non-ionic photo-acid generators for applications in two-photon lithography

L. Steidl, S. J. Jhaveri, R. Ayothi, J. Sha, J. D. McMullen, S. Y. C. Ng, W. R. Zipfel, R. Zentel and C. K. Ober, J. Mater. Chem., 2009, 19, 505 DOI: 10.1039/B816434G

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