Issue 11, 2008

Self-assembled nanostructures from homopolymer induced by UV and solvent exposure

Abstract

A simple method for creating self-assembled nanostructures using a single polymer system is reported. When spin-coated polystyrene thin films were irradiated with UV light and treated with toluene, unique nanostructures were observed, evolving from star-shaped networks to arrays of concentric circles. The nanostructure formation is a result of differential responses of crosslinked and oxidized products to the solvent by a combined effect of phase separation and solvent swelling. The nanostructures were observed for polymers of different molecular weights, films of different thicknesses, and on various substrates.

Graphical abstract: Self-assembled nanostructures from homopolymer induced by UV and solvent exposure

Supplementary files

Article information

Article type
Communication
Submitted
30 Apr 2008
Accepted
13 Aug 2008
First published
27 Aug 2008

Soft Matter, 2008,4, 2164-2167

Self-assembled nanostructures from homopolymer induced by UV and solvent exposure

S. Chada and M. Yan, Soft Matter, 2008, 4, 2164 DOI: 10.1039/B807328G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements