High-resolution soft lithography of thin film resists enabling nanoscopic pattern transfer
Abstract
Soft UV-imprint
* Corresponding authors
a
Polymer Science and Engineering Department, University of Massachusetts Amherst, Conte Center for Polymer Research, 120 Governors Drive, Amherst, Massachusetts 01003, USA
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Soft UV-imprint
I. W. Moran, D. F. Cheng, S. B. Jhaveri and K. R. Carter, Soft Matter, 2008, 4, 168 DOI: 10.1039/B711506G
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