Issue 30, 2008
From the journal:

Journal of Materials Chemistry

Direct deposition of nanoparticulate rhodium–chromium mixed-oxides on a semiconductor powder by band-gap irradiation†

Kazuhiko Maeda,‡a   Daling Lu,b   Kentaro Teramura§a  and  Kazunari Domen*a  

* Corresponding authors

a Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
E-mail: domen@chemsys.t.u-tokyo.ac.jp
Fax: +81-3-5841-8838
Tel: +81-3-5841-1148

b Chemical Resources Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

Abstract

A nanoparticulate mixed-oxide of rhodium and chromium (Rh2−yCryO3) is directly deposited on a semiconductor powder by band-gap irradiation in aqueous solutions containing (NH4)3RhCl6 and K2CrO4, demonstrating the first example of photodeposition of a mixed metal-oxide using photoactive semiconductors.

Graphical abstract: Direct deposition of nanoparticulate rhodium–chromium mixed-oxides on a semiconductor powder by band-gap irradiation

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Article information

DOI
https://doi.org/10.1039/B808484J
Article type
Communication
Submitted
20 May 2008
Accepted
19 Jun 2008
First published
30 Jun 2008

J. Mater. Chem., 2008,18, 3539-3542

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Direct deposition of nanoparticulate rhodium–chromium mixed-oxides on a semiconductor powder by band-gap irradiation

K. Maeda, D. Lu, K. Teramura and K. Domen, J. Mater. Chem., 2008, 18, 3539 DOI: 10.1039/B808484J

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