Issue 23, 2008

Large oriented mesoporous self-supporting Ni–Al oxide films derived from layered double hydroxide precursors

Abstract

Large (~1 cm2) transparent highly (111)-oriented mesoporous self-supporting Ni–Al oxide films of uniform small nanoparticles have been prepared using an Ni2Al(OH)6(NO3)·2.1H2O layered double hydroxide (LDH) as a single precursor. The monodisperse small LDH nanoparticles (about 20 nm in diameter) are first cast as an oriented assembly on a glass substrate to form large transparent self-supporting (00l)-oriented LDH films. Subsequent heating in air affords (111)-oriented mesoporous Ni–Al oxide films preserving the shape, dimensions and optical transparency of the films. The process involves a topotactic transformation from the LDH (00l) facet to the NiO and NiAl2O4 spinel (111) facets, demonstrated here for the first time, and does not require any template, structure-directing agent, or lattice-matched single crystal substrate. The nanostructures of the resulting mixed metal oxide films can be controlled by changing the calcination temperature: Al-doped NiO and composite NiO/NiAl2O4 films of uniform small nanoparticles have been obtained at 500 °C and 900 °C respectively. The pore size and pore size distribution increase monotonically with temperature due to the increased sintering of the nanoparticles at higher temperatures. The resulting large transparent Ni–Al oxide films have a narrow distribution of mesopores (<10 nm) and high thermal stability, suggesting their potential application as catalysts or catalyst supports, in sensors, and as ultrafiltration membranes in harsh environments.

Graphical abstract: Large oriented mesoporous self-supporting Ni–Al oxide films derived from layered double hydroxide precursors

Supplementary files

Article information

Article type
Paper
Submitted
29 Jan 2008
Accepted
10 Mar 2008
First published
08 Apr 2008

J. Mater. Chem., 2008,18, 2666-2672

Large oriented mesoporous self-supporting Ni–Al oxide films derived from layered double hydroxide precursors

C. Li, L. Wang, M. Wei, D. G. Evans and X. Duan, J. Mater. Chem., 2008, 18, 2666 DOI: 10.1039/B801620H

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