Issue 35, 2008
From the journal:

Chemical Communications

Low reactivity of non-bridging oxygen defects on stoichiometric silica surfaces†

Said Hamad‡a  and  Stefan T. Bromley*bc  

* Corresponding authors

a Dept. of Chemistry, University College London, London, UK

b Dept. Química Fisica i Institut de Recerca de Química Teórica i Computacional, Uni. de Barcelona, Spain
E-mail: s.bromley@ub.edu
Fax: +34 934021231
Tel: +34 934039266

c Institució Catalana de Recerca i Estudis Advançats (ICREA), Spain
E-mail: stefan.bromley@icrea.cat

Abstract

Using ab initio molecular dynamics simulations we demonstrate that surfaces of stoichiometric silica exhibiting non-bridging oxygen defects can be surprisingly resistant to attack by water.

Graphical abstract: Low reactivity of non-bridging oxygen defects on stoichiometric silica surfaces

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Article information

DOI
https://doi.org/10.1039/B807291D
Article type
Communication
Submitted
29 Apr 2008
Accepted
27 May 2008
First published
14 Jul 2008

Chem. Commun., 2008, 4156-4158

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Low reactivity of non-bridging oxygen defects on stoichiometric silica surfaces

S. Hamad and S. T. Bromley, Chem. Commun., 2008, 4156 DOI: 10.1039/B807291D

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