Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO2
Abstract
The dissolution characteristics of small molecule photoresist films in supercritical CO2 are measured using
* Corresponding authors
a School of Chemical and Biomolecular Engineering, Cornell University, Ithaca, NY 14853, USA
b Department of Chemistry and Chemical Biology, Cornell University, Ithaca, NY 14853, USA
c
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853, USA
E-mail:
cober@ccmr.cornell.edu
The dissolution characteristics of small molecule photoresist films in supercritical CO2 are measured using
N. M. Felix, A. De Silva, C. M. Y. Luk and C. K. Ober, J. Mater. Chem., 2007, 17, 4598 DOI: 10.1039/B709649F
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content