Issue 7, 2006
From the journal:

Soft Matter

Chemical force microscopy for hot-embossing lithography release layer characterization

Neil S. Cameron,*a   Arnaud Ott,a   Hélène Robergea  and  Teodor Veresa  

* Corresponding authors

a Industrial Materials Institute: National Research Council Canada, 75 Blvd. de Mortagne, Boucherville, Québec, J4B 6Y4, Canada
E-mail: neil.cameron@cnrc.gc.ca
Fax: +1 (450) 641-5105
Tel: +1 (450) 641-5168

Abstract

We employed variable temperature chemical force microscopy (VT-CFM) using tips silanized with four different hydro- and hydrofluoroalkyl self-assembling monolayers (SAMs) interacting with a thin-film of poly(cyclic olefin), (PCO) to model the hot-embossing stamp-polymer interaction over a temperature range spanning the glass transition of the PCO.

Graphical abstract: Chemical force microscopy for hot-embossing lithography release layer characterization

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Article information

DOI
https://doi.org/10.1039/B600936K
Article type
Communication
Submitted
31 Jan 2006
Accepted
13 Apr 2006
First published
17 May 2006

Soft Matter, 2006,2, 553-557

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Chemical force microscopy for hot-embossing lithography release layer characterization

N. S. Cameron, A. Ott, H. Roberge and T. Veres, Soft Matter, 2006, 2, 553 DOI: 10.1039/B600936K

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