The conformational bias of aryl, arylsulfonyl geminally substituted tertiary carbon centers: applications in substrate-based stereocontrol†
Abstract
Intramolecular
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* Corresponding authors
a
Department of Process Research, Merck Sharp & Dohme Research Laboratories, Hertford Road, Hoddesdon, Hertfordshire
E-mail:
jeremy_scott@merck.com
b Department of Process Research, Merck Research Laboratories, P.O. BOX 2000, Rahway, USA
Intramolecular
J. P. Scott, P. R. Mullens, S. E. Brewer, K. M. J. Brands, J. R. Chilenski, A. J. Davies, A. D. Gibb, D. R. Lieberman, S. F. Oliver and Ulf-H. Dolling, Org. Biomol. Chem., 2006, 4, 1806 DOI: 10.1039/B601647B
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