Issue 4, 2006
From the journal:

New Journal of Chemistry

Chemical vapour deposition of titanium chalcogenides and pnictides and tungsten oxide thin films†

Robert G. Palgravea  and  Ivan P. Parkin*a  

* Corresponding authors

a University College London, Department of Chemistry, 20 Gordon Street, London, UK
E-mail: i.p.parkin@ucl.ac.uk

Abstract

This perspective article focuses on the formation of titanium chalcogenides and pnictides and tungsten oxides by chemical vapour deposition. Attention is focused on the role of the precursor and on the different microstructures that can be produced under different conditions.

Graphical abstract: Chemical vapour deposition of titanium chalcogenides and pnictides and tungsten oxide thin films

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/B513177D
Article type
Perspective
Submitted
16 Sep 2005
Accepted
09 Jan 2006
First published
30 Jan 2006

New J. Chem., 2006,30, 505-514

Permissions

Request permissions

Chemical vapour deposition of titanium chalcogenides and pnictides and tungsten oxide thin films

R. G. Palgrave and I. P. Parkin, New J. Chem., 2006, 30, 505 DOI: 10.1039/B513177D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements