Deposition of stable hydrophobic coatings with in-line CH4 atmospheric rf plasma
Abstract
A CH4 atmospheric rf plasma treatment process was demonstrated for hydrophobic treatments of various substrates including metallic and insulating surfaces as well as flat and rough surfaces. A stable rf glow plasma was generated over a 1 cm × 16 cm area using a cylindrical electrode geometry. A typical hydrophobic treatment speed was 5–10 cm min−1. CH4 plasma