High-permittivity YScO3 thin films by atomic layer deposition using two precursor approaches
Abstract
Amorphous YScO3 thin films have been deposited by
* Corresponding authors
a
Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P. O. Box 6100, FIN-02015 Espoo, Finland
E-mail:
Pia.Myllymaki@hut.fi
b Department of Chemistry, University of Helsinki, P. O. Box 55, FIN-00014 Helsinki, Finland
c Institute of Experimental Physics and Technology, University of Tartu, Tähe 4, EE-51010 Tartu, Estonia
Amorphous YScO3 thin films have been deposited by
P. Myllymäki, M. Nieminen, J. Niinistö, M. Putkonen, K. Kukli and L. Niinistö, J. Mater. Chem., 2006, 16, 563 DOI: 10.1039/B514083H
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