Issue 4, 2006
From the journal:

Chemical Communications

Incidence and properties of nanoscale defects in silicalite†

Naseem A. Ramsahyea  and  Ben Slater*a  

* Corresponding authors

a Davy Faraday Research Laboratory, The Royal Institution of Great Britain, 21 Albemarle Street, London, UK
E-mail: ben@ri.ac.uk
Fax: +44 207 629 3569
Tel: +44 207 670 2955

Abstract

Crystal intergrowths are predicted to form more readily than other extended defects in a model zeolite membrane and cause a reduction in molecular flux.

Graphical abstract: Incidence and properties of nanoscale defects in silicalite

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Article information

DOI
https://doi.org/10.1039/B513582F
Article type
Communication
Submitted
26 Sep 2005
Accepted
04 Nov 2005
First published
07 Dec 2005

Chem. Commun., 2006, 442-444

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Incidence and properties of nanoscale defects in silicalite

N. A. Ramsahye and B. Slater, Chem. Commun., 2006, 442 DOI: 10.1039/B513582F

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