Issue 6, 2005
From the journal:

Journal of Materials Chemistry

Fabrication of positively and negatively charged polyelectrolyte structures by dip-pen nanolithography

Meng Yu,a   Dorjderem Nyamjavb  and  Albena Ivanisevic*ac  

* Corresponding authors

a Department of Biomedical Engineering, Purdue University, West Lafayette, USA

b Department of Physics, Purdue University, West Lafayette, USA

c Department of Chemistry, Purdue University, West Lafayette, USA
E-mail: albena@purdue.edu

Abstract

Dip-Pen Nanolithography (DPN) is successfully used to pattern two polyelectrolytes: poly(diallyldimethylammonium) chloride, PDDA and poly(styrenesulfonate), PSS, on two types of surfaces: clean SiOx and SiOx coated with a layer of PDDA. Lateral Force Microscopy, Force Volume Imaging and X-ray Photoelectron Spectroscopy were used to verify the chemical composition of the patterns.

Graphical abstract: Fabrication of positively and negatively charged polyelectrolyte structures by dip-pen nanolithography

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Article information

DOI
https://doi.org/10.1039/B409406A
Article type
Communication
Submitted
21 Jun 2004
Accepted
17 Dec 2004
First published
11 Jan 2005

J. Mater. Chem., 2005,15, 649-652

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Fabrication of positively and negatively charged polyelectrolyte structures by dip-pen nanolithography

M. Yu, D. Nyamjav and A. Ivanisevic, J. Mater. Chem., 2005, 15, 649 DOI: 10.1039/B409406A

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