Fullerene monolayers adsorbed on high index gold single crystal surfaces
Abstract
Copper underpotential deposition (Cu UPD) and
* Corresponding authors
a
Centre for Nanoscale Science, Department of Chemistry, The University of Liverpool, Liverpool, UK
E-mail:
d.j.schiffrin@liv.ac.uk
Fax: +44-151-794-3588
Tel: +44-151-794-3574
b Departamento de Química-Física, Universidad de Alicante, Apd. 99, E-03080 Alicante, Spain
Copper underpotential deposition (Cu UPD) and
Please wait while we load your content...
Something went wrong. Try again?
A. Kuzume, E. Herrero, J. M. Feliu, R. J. Nichols and D. J. Schiffrin, Phys. Chem. Chem. Phys., 2004, 6, 619 DOI: 10.1039/B311393K
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content