Issue 19, 2004
From the journal:

Chemical Communications

Unprecedented insertion reaction of a silylene into a B–B bond and generation of a novel borylsilyl anion by boron–metal exchange reaction of the resultant diborylsilane†

Takashi Kajiwara,a   Nobuhiro Takeda,a   Takahiro Sasamoria  and  Norihiro Tokitoh*a  

* Corresponding authors

a Institute for Chemical Research, Kyoto University, Gokasho, Japan
E-mail: tokitoh@boc.kuicr.kyoto-u.ac.jp
Fax: +81 774 38 3209
Tel: +81 774 38 3200

Abstract

A kinetically stabilized diarylsilylene, Tbt(Mes)Si: (1, Tbt = 2,4,6-tris[bis(trimethylsilyl)methyl]phenyl, Mes = mesityl), thermally generated from overcrowded disilene Tbt(Mes)Si[double bond, length as m-dash]Si(Mes)Tbt (2) or stable silylene–isocyanide complex (3a), was found to insert into a B–B bond of bis(pinacolato)diboron, B2(pin)2 (4), and the boron–lithium exchange reaction of the resulting diborylsilane gave the first borylsilyl anion.

Graphical abstract: Unprecedented insertion reaction of a silylene into a B–B bond and generation of a novel borylsilyl anion by boron–metal exchange reaction of the resultant diborylsilane

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Article information

DOI
https://doi.org/10.1039/B409575H
Article type
Communication
Submitted
24 Jun 2004
Accepted
20 Jul 2004
First published
20 Aug 2004

Chem. Commun., 2004, 2218-2219

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Unprecedented insertion reaction of a silylene into a B–B bond and generation of a novel borylsilyl anion by boron–metal exchange reaction of the resultant diborylsilane

T. Kajiwara, N. Takeda, T. Sasamori and N. Tokitoh, Chem. Commun., 2004, 2218 DOI: 10.1039/B409575H

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