Issue 5, 2003

Preparation of TiO2 thin films on polystyrene by liquid phase deposition

Abstract

Polystyrene (PS) substrates were functionalized by wet chemical grafting with 2-acrylamido-2-methylpropane-1-sulfonic acid (AMPS). Subsequently, TiO2 thin films were prepared by liquid phase deposition (LPD) with an average growth rate of 85 nm h−1; a maximum thickness of 750 nm was observed in our experiments. The crystalline fraction of the precipitated material was estimated to be 58% by X-ray powder-diffraction. Significantly improved film adhesion was achieved on grafted substrates, as compared to non-functionalized polymers, due to the formation of a thin, coherent primer layer in the early stages of mineralization.

Graphical abstract: Preparation of TiO2 thin films on polystyrene by liquid phase deposition

Article information

Article type
Paper
Submitted
17 Dec 2002
Accepted
17 Feb 2003
First published
05 Mar 2003

J. Mater. Chem., 2003,13, 1058-1063

Preparation of TiO2 thin films on polystyrene by liquid phase deposition

A. Dutschke, C. Diegelmann and P. Löbmann, J. Mater. Chem., 2003, 13, 1058 DOI: 10.1039/B212535H

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