Issue 2, 2003
From the journal:

Journal of Materials Chemistry

Stable poly(fullerene oxide) thin films derived from hexanitro[60]fullerene

Run-Sheng Zhai,ab   Arindam Das,a   Chau-Chung Han,c   Taizoon Canteenwala,a   Long Y. Chianga  and  Tung J. Chuangac  

a Center for Condensed Matter Sciences, National Taiwan University, Taipei 106, Taiwan
E-mail: chuangtj@ccms.ntu.edu.tw

b Dalian Institute of Chemical Physics, The Chinese Academy of Sciences, Dalian 116023, P. R. China

c Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan

Abstract

A new approach for the fabrication of poly(fullerene oxide) thin films that are stable up to 800 K and above by thermal treatment of hexanitro[60]fullerene is described. The reaction proceeds via the rearrangement of fullerenic nitro moieties and cleavage of the –O–NO bond in the nitrito groups; spectroscopic and mass spectrometric evidence for the oligomeric structure is presented.

Graphical abstract: Stable poly(fullerene oxide) thin films derived from hexanitro[60]fullerene

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Article information

DOI
https://doi.org/10.1039/B209567J
Article type
Communication
Submitted
01 Oct 2002
Accepted
26 Nov 2002
First published
03 Dec 2002

J. Mater. Chem., 2003,13, 167-169

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Stable poly(fullerene oxide) thin films derived from hexanitro[60]fullerene

R. Zhai, A. Das, C. Han, T. Canteenwala, L. Y. Chiang and T. J. Chuang, J. Mater. Chem., 2003, 13, 167 DOI: 10.1039/B209567J

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