Plasma etched polymer microelectrochemical systems
Abstract
This paper presents a novel technique based on
* Corresponding authors
a DiagnoSwiss, Rte de l’Ile-aux-Bois, c/o Cimo S.A, Monthey, Switzerland
b Laboratoire d’Electrochimie, Ecole Polytechnique Fédérale de Lausanne, Laboratoire d’Electrochimie Physique et Analytique, Lausanne, Switzerland
This paper presents a novel technique based on
J. S. Rossier, C. Vollet, A. Carnal, G. Lagger, V. Gobry, H. H. Girault, P. Michel and F. Reymond, Lab Chip, 2002, 2, 145 DOI: 10.1039/B204063H
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