IR laser-induced reactive ablation of silicon monoxide in hydrogen and water atmosphere

Vladislav Dřínek; Zdeněk Bastl; Jan Šubrt; Akira Yabe; Josef Pola

doi:10.1039/B200058J

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Vladislav Dřínek,^a Zdeněk Bastl,^b Jan Šubrt,^c Akira Yabe^d and Josef Pola*^a

Author affiliations

* Corresponding authors

^a Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, Prague, Czech Republic

^b J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Prague, Czech Republic

^c Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, Řež near Prague, Czech Republic

^d National Institute of Materials and Chemical Research, AIST, MITI, Tsukuba, Ibaraki, Japan

Abstract

TEA CO₂ laser induced ablation of solid amorphous silicon monoxide in H₂ and H₂O atmosphere results in deposition of hydrogenated SiO_x films, which reveals that ablated silicon monoxide fragments are reactive towards H₂ and H₂O. The films analyzed by FTIR and XP spectroscopy are revealed as rich in H, composed of Si⁰ and several Si_xO_yH_z configurations and containing both Si–OH and Si–H bonds. The films produced in H₂O have (Si)H mostly bonded in the (O₃)Si–H unit and those produced in H₂ have H attached to Si which is bonded to 1–3 oxygen atoms.

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Article information

DOI: https://doi.org/10.1039/B200058J
Article type: Paper
Submitted: 03 Jan 2002
Accepted: 04 Apr 2002
First published: 26 Apr 2002

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J. Mater. Chem., 2002,12, 1800-1805

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