Issue 2, 2002
From the journal:

Journal of Materials Chemistry

Paul A. Williams,a   John L. Roberts,a   Anthony C. Jones,*ac   Paul R. Chalker,b   Jamie F. Bickley,a   Alexander Steiner,a   Hywel O. Daviesc  and  Timothy J. Leedhamc  

* Corresponding authors

a Department of Chemistry and Surface Science Research Centre, University of Liverpool, Liverpool, UK
E-mail: tony@tjconsultancy.demon.co.uk

b Department of Materials Science and Engineering, University of Liverpool, Liverpool, UK

c Inorgtech Limited, 25 James Carter Road, Mildenhall, Suffolk, UK

Abstract

The novel complexes [Zr(OBut)2(OCMe2CH2OMe)2] (1) and [Hf(OBut)2(OCMe2CH2OMe)2] (2) are mononuclear and volatile, and are highly promising precursors for the deposition of zirconium dioxide and hafnium dioxide thin films by metalorganic chemical vapour deposition (MOCVD).

Graphical abstract: Novel mononuclear zirconium and hafnium alkoxides; improved precursors for the MOCVD of ZrO2 and HfO2

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Article information

DOI
https://doi.org/10.1039/B109994A
Article type
Communication
Submitted
11 Nov 2001
Accepted
27 Nov 2001
First published
12 Dec 2001

J. Mater. Chem., 2002,12, 165-167

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Novel mononuclear zirconium and hafnium alkoxides; improved precursors for the MOCVD of ZrO2 and HfO2

P. A. Williams, J. L. Roberts, A. C. Jones, P. R. Chalker, J. F. Bickley, A. Steiner, H. O. Davies and T. J. Leedham, J. Mater. Chem., 2002, 12, 165 DOI: 10.1039/B109994A

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