Jump to main content
Jump to site search

Issue 9, 2002
Previous Article Next Article

Improving the detection limits for vapor phase decomposition-inductively coupled plasma mass spectrometry (VPD-ICP-MS) analysis

Author affiliations

Abstract

Semiconductor industry roadmaps are driving device geometries into the 0.13 micron range. Implementing smaller device dimensions requires cleaner chemicals and, more importantly, cleaner production processes. Vapor phase decomposition (VPD) is a method by which trace elements on the surface of a silicon wafer are collected into a liquid sample. Inductively coupled plasma mass spectrometry (ICP-MS) analysis of the resulting liquid sample is a direct approach for measuring the cleanliness of production processes run in the wafer fab. Required analytical measurements at <108 atoms cm−2 have forced the need for lower detection limits, lower instrument background, higher sensitivity and well-controlled analytical blanks in VPD-ICP-MS analysis. This paper will discuss measures taken to improve detection limits for VPD-ICP-MS analysis through improved measurement methods using high resolution ICP-MS and the elimination of potential contaminants during the VPD sample preparation procedure.

Back to tab navigation

Article information


Submitted
18 Feb 2002
Accepted
11 Jun 2002
First published
29 Jul 2002

J. Anal. At. Spectrom., 2002,17, 1194-1201
Article type
Paper

Improving the detection limits for vapor phase decomposition-inductively coupled plasma mass spectrometry (VPD-ICP-MS) analysis

E. Jones Ferrero and D. Posey, J. Anal. At. Spectrom., 2002, 17, 1194
DOI: 10.1039/B201759H

Social activity

Search articles by author

Spotlight

Advertisements