Issue 21, 2002

Eley–Rideal diffusion limited reactions over rough surface

Abstract

The effect of surface roughness on Eley–Rideal diffusion limited reactions is studied. The rough surfaces are generated using a random deposition model and a random deposition with diffusion model. The former model generates the rough surface with no correlations between the heights of different columns whereas the latter generates the rough surface with correlations between the heights of different columns. Multifractal scaling analysis has been carried out on the reaction probability distribution. The reaction probability distribution has a wider range for the surface of random deposition than that of random deposition with diffusion.

Article information

Article type
Paper
Submitted
05 Jun 2002
Accepted
04 Sep 2002
First published
27 Sep 2002

Phys. Chem. Chem. Phys., 2002,4, 5330-5334

Eley–Rideal diffusion limited reactions over rough surface

A. Chaudhari, C. Sanders Yan and S. Lee, Phys. Chem. Chem. Phys., 2002, 4, 5330 DOI: 10.1039/B205444M

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