Issue 2, 2001

Abstract

This paper reports the first results obtained on calcium gadolinium oxoborate GdCa4O(BO3)3 (GdCOB) thin films grown on silicon coated with amorphous silica at high temperature by pulsed-laser deposition (PLD). It was found that the chemical composition (i.e. Ca/Gd ratio) depends critically on the oxygen pressure used during pulsed-laser deposition (PLD) experiments. The crystallization of thin films about 500 nm thick required a high temperature substrate (750 °C) during the PLD process followed by a post annealing treatment at 800 °C in an oxygen atmosphere. Under these conditions, the layers are polycrystalline and no texturation features have been found. The surfaces of the films are smooth (average roughness: 5-6 nm) with only a few particles or droplets. The refractive index of the films is estimated to be 1.746 at 633 nm, in agreement with the bulk GdCOB value.

Article information

Article type
Paper
Submitted
05 Oct 2000
Accepted
08 Nov 2000
First published
10 Jan 2001

J. Mater. Chem., 2001,11, 657-659

Growth of GdCa4O(BO3)3 thin films by pulsed-laser deposition for nonlinear optical applications

R. Chety, E. Millon, A. Boudrioua, J. C. Loulergue, A. Dahoun and J. Perrière, J. Mater. Chem., 2001, 11, 657 DOI: 10.1039/B008053P

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