Issue 16, 2001

Studies on the effects of Cd ion sources and chelating reagents on atomic layer CdS deposition by successive ionic layer adsorption and reaction (SILAR) method

Abstract

CdS thin films were fabricated on an ITO-covered glass substrate by the successive ionic layer adsorption and reaction (SILAR) method under various conditions. By changing Cd ion sources, chelating reagents, and pH the obtained films were evaluated by their thickness, crystallinity, crystallite size, surface roughness and elemental composition. CdCl2 and triethanolamine were found to provide the most well crystallized thick films among six Cd salts and six chelating reagents. In the present study, no marked effect of pH on the film quality was observed compared to the effect of the difference in the counter ions. The effects of counter ions, chelating reagents, and pH could be explained in terms of the stability constant of Cd2+ for these chemical species and SH−.

Article information

Article type
Paper
Submitted
31 Jan 2001
Accepted
09 May 2001
First published
05 Jun 2001

Phys. Chem. Chem. Phys., 2001,3, 3371-3376

Studies on the effects of Cd ion sources and chelating reagents on atomic layer CdS deposition by successive ionic layer adsorption and reaction (SILAR) method

M. Sasagawa and Y. Nosaka, Phys. Chem. Chem. Phys., 2001, 3, 3371 DOI: 10.1039/B101075L

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