Chemically amplified soft lithography of a low band gap polymer
Abstract
A solid state, acid-catalyzed reaction leading to chemically amplified soft lithography is demonstrated with a low band gap conjugated polymer; poly({3-[11-(tetrahydropyran-2-yloxy)undecyl]thiophene-2,5-diyl} -3,4-ethylenedioxythiophene-2,5-diyl).