Monitoring metal ion contamination onset in hydrofluoric acid using silicon–diamond and dual silicon sensing electrodeassembly
Abstract
Potentiometric detection of trace levels of metallic contamination onset in
* Corresponding authors
a Department of Chemistry, University of North Texas, Denton, TX 76203-5070, USA
Potentiometric detection of trace levels of metallic contamination onset in
Monitoring metal ion contamination onset in
T. Ponnuswamy, J. Chen, F. Xu and O. Chyan, Analyst, 2001, 126, 877 DOI: 10.1039/B009841H
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