Issue 6, 1999

Photochemical generation of acrylate radicals by sensitizing with acetone–propan-2-ol. A laser photolysis Fourier transform electron paramagnetic resonance study

Abstract

The sensitized generation of acrylate radicals was studied in acrylate–acetone–propan-2-ol solution by using laser photolysis with time-resolved Fourier transform electron paramagnetic resonance (EPR). In addition to the acetone ketyl radical, vinyl-type radicals of various acrylates were observed in the nanosecond and microsecond time scales. Classification as vinyl-type radical structures was underpinned by quantum-chemical calculations. The acrylate radicals were E/A spin-polarized by the CIDEP radical pair mechanism as described. A triplet exciplex is proposed as the precursor state of the acetone–acrylate radical pair. This interpretation is supported by quantum-chemical calculations.

Article information

Article type
Paper

J. Chem. Soc., Perkin Trans. 2, 1999, 1075-1080

Photochemical generation of acrylate radicals by sensitizing with acetone–propan-2-ol. A laser photolysis Fourier transform electron paramagnetic resonance study

A. Beckert, S. Naumov, R. Mehnert and D. Beckert, J. Chem. Soc., Perkin Trans. 2, 1999, 1075 DOI: 10.1039/A901975H

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements