Composite materials obtained by ion irradiation: Mn implantation in silica glass

Abstract

Ion implantation in silica is a useful way to generate unusual properties in glasses. To use ion implantation as a synthesis technique, it is necessary to understand the dynamics of the process. Silica glass samples, implanted with Mn at 38 keV energy and fluences of 1 × 10¹⁶, 5 × 10¹⁶ and 10 × 10¹⁶ ions cm^–2 were investigated mainly by X-ray photoelectron (XPS), X-ray-excited Auger electron (XE-AES) and UV-photoelectron (UPS) spectroscopies. Rutherford backscattering (RBS) and secondary ion mass spectrometry (SIMS) measurements, optical absorption and electron paramagnetic resonance (EPR) investigations were also performed. Mn silicate is present in all samples, while in the 5 × 10¹⁶ and 10 × 10¹⁶ samples Mn silicide compounds form in the most damaged region. These findings give further support to the two-step model as a simple method to predict the final compounds resulting from ion irradiation of a solid matrix.