Electrochemical syntheses of two doped forms of poly (sulfur nitride), {[SN]5[AsF6]}x and {[SN]50[AsF6]}x

Abstract

The electrochemical properties of [S₅N₅][AsF₆] and [SN][AsF₆] are reported; both undergo irreversible reduction to give unstable radicals which oligomerise to form polymers of approximate formulae {[SN]₅₀[AsF₆]}_x and {[SN]_{5 –δ}[AsF₆]}_x, respectively. The electrochemical and immersion deposition syntheses of (SN)_x films from [S₅N₅][AsF₆] solution are reported; they provide simple, practical demonstrations of the electrochemical synthesis of (SN)_x A comparison of (SN)_x, films prepared by vapour deposition and electrodeposition methods is made, and the electron-beam etching of (SN)_x, layers is reported.