Issue 2, 1996

Laser-induced chemical vapour deposition of Si/C/H materials from monoorganylsilanes

Abstract

Laser-induced photolysis of monoorganylsilanes RSiH3(R = H2C[double bond, length half m-dash]CH, HC[triple bond, length as m-dash]C, ClHC[double bond, length as m-dash]CH and H2C[double bond, length as m-dash]CHCH2) produces thin Si/C/H films, thought to be saturated polycarbosilanes of low hydrogen content, and formed from unsaturated transients generated upon elimination of hydrogen and ethyne from the RSiH3 molecules. The films incorporate oxygen upon exposure to the atmosphere.

Article information

Article type
Paper

J. Mater. Chem., 1996,6, 155-160

Laser-induced chemical vapour deposition of Si/C/H materials from monoorganylsilanes

J. Pola, Z. Bastl, J. Šubrt, J. R. Abeysinghe and R. Taylor, J. Mater. Chem., 1996, 6, 155 DOI: 10.1039/JM9960600155

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